Predict etch rates.
With confidence.
Every prediction draws from 810+ records extracted from peer-reviewed literature. Results include a confidence interval, source DOI, and selectivity ratios for adjacent materials.
The foundation of semiconductor wet processing. Isotropic and anisotropic etch in KOH, TMAH, HF and BHF-based systems. Orientation and doping dependence for silicon. Selectivity pairs for all three material combinations.
ALD and sputtered high-k oxides in dilute HF, BHF, H₃PO₄ and SC-1 systems. Integrated GHS hazard information for all supported etchants, sourced from PubChem. Step-by-step preparation guidance with correct addition order and PPE requirements.
Thin film metallization layers common in MEMS, packaging and interconnect fabrication. Etch rates in standard metal etchants, H₃PO₄:HNO₃:CH₃COOH blends, peroxide and fluoride-based systems. Selectivity relative to underlying dielectrics and silicon.
Compound semiconductors for photonics, RF and power devices, plus refractory metals and copper for interconnect and MEMS applications. All materials are now available in early access. Photo-assisted etch detection is active for GaAs, InP, InGaP and GaN: light exposure can increase etch rates 5 to 50 times and requires explicit user confirmation.
Wide-bandgap semiconductors, quaternary III/V alloys, transparent conductive oxides and polymer resists. Completes the full wet-etch material stack encountered in compound semiconductor and advanced MEMS processes.
Min/expected/max intervals with confidence scores. Arrhenius extrapolation to temperatures outside the measured range, with propagated uncertainty.
Every value traces back to peer-reviewed literature. No black-box numbers. Each result lists the source count and DOI references used in the prediction.
Material-pair selectivity matrix derived from the same literature database. Suitable, Marginal and Avoid thresholds computed automatically for mask compatibility.
GHS hazard data from PubChem and step-by-step preparation guidance with correct addition order and PPE requirements for every supported etchant.
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